Optimizing equipment and processes with granular material simulation
29. září 2026 | od 17,00 CEST | Live webinar

Efficient handling and processing of particulate materials is critical to improving operational efficiency, reducing costs, and accelerating product development across process industries. However, physical testing of particulate processes remains time-consuming and expensive, with traditional trial-and-error approaches leading to high costs in materials, labor, equipment usage, and waste management.

The Discrete Element Method (DEM) is now widely recognized as a powerful modeling and simulation technology for accurately predicting the behavior of particulate systems—from powders and granules to pellets and bulk solids. DEM enables manufacturers to gain deep insight into particle behavior and optimize critical processes such as mixing, coating, granulation, conveying, filling, compaction, and wear.

Leading global process-industry organizations use Simcenter EDEM™ to improve process efficiency and robustness, enhance product quality, reduce prototyping and scale-up risk, and shorten time to market.

Join us for a free virtual event to explore the latest advances in DEM for process industries. Hear from industry leaders and Simcenter EDEM experts as they showcase proven methodologies, real-world applications and the newest simulation capabilities.

Discover how DEM, combined with machine learning and digital twins, can support your digital transformation strategy and help you:

• Develop robust, scalable process recipes from R&D to production
• Enable right-first-time technology transfer during process scale-up
• Define and validate robust control strategies early in development
• Manufacture commercial-scale processes with consistent, high-quality performance

The webinar will be led by Senthil Arumugam, Global Director of Particle Solutions at Siemens Digital Industries Software, who has more than 17 years of experience in discrete element method (DEM) simulations and customer implementations worldwide.